Back to results
US 4,287,289 AGranted
Photoresist cyclized rubber and bisazide compositions containing a monoazo photoextinction agent
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorTakayuki Sato
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorTakayuki Sato
Estimating the term…
A novel photoresist composition is proposed which is very advantageously employed in the photoetching process for the manufacture of various kinds of electronic devices such as transistors, ICs, LSIs and the like. The photoresist composition of the invention comprises a cyclized rubber as the base component and a specified azobenzene compound as a photoextinction agent for preventing halation in the exposure of the photoresist films to ultraviolet light. The advantages of the inventive photoresist composition over the conventional ones are obtained in the remarkable stability of the halation preventing effect even after a prebaking treatment of the photoresist films at an elevated temperature to remove the solvent from the photoresist films applied on to the substrate surfaces owing to the unexpectedly small sublimation of the azobenzene compound contained in the photoresist films.
A photoresist composition which comprises a cyclized rubber and a bisazide compound as the principal ingredients and 0.5 to 15% by weight based on said rubber of a photoextinction agent which is a compound represented by the general formula ##STR3## in which R.sup.1 is a lower alkoxy group having from 1 to 6 carbon atoms, R.sup.2 is a hydrogen atom or a lower alkyl group having from 1 to 4 carbon atoms and R.sup.3 and R.sup.4 are each a lower alkyl group having at least 2 carbon atoms or an aralkyl group, as a photoextinction agent.
Dependencies are inferred from the claim text.