US 4,286,871 A · Photogrammetric measuring system

Abstract

An electro-optical measuring system in a photogrammetric comparator or stereocompiler comprises a visible light transparent phase grating which is carried upon a surface of the photo support plate of the device. The grating is formed as a composite layer of .lambda./4 films of at least two dielectric materials of different refractive index which are deposited on the support in such a manner as to yield parallel bands in which the two film materials are in alternating sequence from band to band. As a result of this structure which ensures a constant physical and optical thickness with respect to transmitted imaging light over the whole granting pattern, image-degrading diffraction of the transmitted visible light is avoided, yet the grating pattern provides interfering diffraction in reflection which may be utilized in a precise displacement measuring system.

Claims9

Dependent claims

An electro-optic measuring system comprising:

(a) a light source;
(b) a first reticle grating pattern situated in the light from said source;
(c) a reflective phase grating pattern situated in the light transmitted by said reticle grating pattern, said grating patterns being substantially parallel and arranged for relative movement therebetween in the direction of the period of said patterns;
(d) a second reticle grating pattern situated substantially equidistant with said first reticle pattern from said phase grating pattern and in the light reflected therefrom;
and
(e) photoelectric means arranged in the light transmitted by said second reticle grating pattern and providing a varying electrical signal in response to the fluctuation in light intensity resulting from said relative movement.

3 more elements

The method of making a reflective phase grating which comprises:

(a) providing a plane-surfaced transparent support;
(b) forming on the plane surface of said support a regular period grating pattern of a first material which exhibits substantial solubility in a first liquid;
(c) depositing over the whole of said patterned support surface to a thickness of about .lambda./4 a layer of a second material consisting essentially of a dielectric having a given index of refraction, said second material exhibiting no substantial solubility in said first liquid;
(d) depositing over the whole of said second material layer to a thickness of about .lambda./4 a layer of a third material consisting essentially of a dielectric having an index of refraction significantly different from that of said second material, said third material exhibiting no substantial solubility in said first liquid;
(e) depositing over the whole of said third material layer a layer of a fourth material which exhibits no substantial solubility in said first liquid, but exhibits substantial solubility in a second liquid in which said second and third materials exhibit no substantial solubility;
(f) applying said first liquid to the resulting layered support, thereby dissolving said pattern of first material and effecting removal thereof from said support with overlying, coextensive portions of said deposited layers of second, third, and fourth materials;
(g) depositing over the whole of the resulting patterned support surface a .lambda./4 layer of said third material;
(h) depositing over the whole of said third material layer a .lambda./4 layer of said second material;
(i) applying said second liquid to the resulting layered support, thereby dissolving the remaining portions of said fourth material layer and effecting removal thereof from said support with overlying, coextensive portions of the subsequently deposited layers of said second and third materials;
whereby said support is provided with a composite layer of substantially uniform thickness wherein said regular period pattern is reproduced in a first layer of dielectric material the reflecting surface of which is offset from said support surface by a difference of about .lambda./4 from that of a second, complementary pattern layer of the same dielectric material, thereby to yield in light reflected therefrom a phase difference of about .lambda./2 according to said pattern.

7 more elements

Dependencies are inferred from the claim text.

Photogrammetric measuring system

Life of this patent

Photogrammetric measuring system

Life of this patent

Abstract

Claims9