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US 4,285,800 AGranted
Gas plasma reactor for circuit boards and the like
AssigneeBranson International Plasma Corporation
InventorJoseph M. Welty
Life of this patent
Estimating the term…
Abstract
Gas plasma reactor for treatment of printed circuit boards and other relatively large, generally planar objects. The reactor includes a rack assembly having a plurality of spaced apart bars for holding the objects and a pair of generally planar electrodes positioned outside the rack assembly. The rack assembly is maintained at ground potential, and the electrodes are energized with RF energy to form an ionizing field between the electrodes and the rack bars.
Claims3
In a gas plasma reactor for treating printed circuit boards:
- a housing defining a reaction chamber, gas inlet and outlet means communicating with the chamber, first and second racks connected electrically to ground and having a plurality of spaced apart generally parallel bars for engaging opposing edges of the printed circuit boards to hold the boards in spaced parallel relationship in the region between the racks, a pair of generally planar electrodes oriented in a position generally perpendicular to the surfaces of the circuit boards and positioned outside the region between the racks, each of said electrodes comprising a plurality of spaced apart rods aligned between the bars of the racks and connected electrically together, and means for energizing the electrodes to ionize the gas to form a plasma in the region between the electrodes and the racks.
Dependencies are inferred from the claim text.