Method and apparatus for measuring and controlling volumetric flow rate of gases in a line
AssigneePrecision Machine Products, Inc.
InventorLyn R. Kennedy
Life of this patent
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AssigneePrecision Machine Products, Inc.
InventorLyn R. Kennedy
Estimating the term…
Disclosed is a method and apparatus for measuring and controlling volumetric flow rate of gases. The apparatus includes a measurement chamber of fixed volume in a flow line, a controllable inlet valve upstream from the chamber, and flow regulator means for establishing constant flow output downstream from the chamber. Also provided are measuring and control equipment including a pressure sensor in the chamber, means for controlling operation of the inlet valve, timing means, and means for calculating volumetric flow rate. The method involves closing the inlet valve at a chosen time for a selected interval, to interrupt flow into the measurement chamber, while maintaining constancy of flow out of the chamber. During at least part of the interval in which the inlet valve is closed, the pressure decrease is measured, and the rate of pressure decrease is calculated by dividing the measured pressure drop by the time measured by the timing means. The thus calculated rate of fall of pressure is directly related to the volumetric flow rate, which is thus determined.
A method for determining the volumetric flow rate of gas flowing in a line comprising:
A method for delivering gas through a line to a point of use at a selected and measured volumetric flow rate comprising:
Apparatus for determining the volumetric flow rate of gas flowing in a line comprising:
Dependencies are inferred from the claim text.