Method for making semiconductor material
AssigneeHewlett-Packard Company
InventorsEgon E. Loebner, Paul E. Greene
Life of this patent
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AssigneeHewlett-Packard Company
InventorsEgon E. Loebner, Paul E. Greene
Estimating the term…
Useful semiconductor materials in which a p-n junction may be formed are made from compositions of the quaternary Ga.sub.y In.sub.1-y As.sub.1-x P.sub.x compound alloy system having values of x and y greater than 0.005 and less than 0.995 or having a value of x equal to 1.0 and a value of y from 0.45 to 0.80. In making these semiconductor materials a layer of selected composition of this compound alloy system is epitaxially grown on a substrate having a lattice constant substantially equal to that of the selected composition by substantially following an isolattice constant contour to the region of selected composition in the alloy system. Injection electroluminescent diodes are fabricated from these semiconductor materials by forming a p-n junction in the layer of selected composition and by forming electrical terminals in contact with the substrate and the layer of selected composition on opposite sides of the p-n junction.
A method of producing a semiconductor material, said method being characterized by the step of:
Dependencies are inferred from the claim text.