Penning sputter source
AssigneeHirada Stechnikai Ipari Kutato Intezet
InventorsGabor Kertesz, Gyorgy Vago
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Abstract
The invention relates to a Penning sputter source which utilizes the Penning gas discharge for producing thin films by sputtering. The invented device guarantees a great productivity and effectiveness of the sputtering process by means for equalizing the magnetic field over the device and by increasing the surface of the active zone of the device. The produced layers are of equal thickness, can be composed of alloys of required composition and produced also on plastic substrates having low thermostability.
Claims13
A Penning sputter source comprising a screen system forming an outer housing, an anode, a cathode, an exciting magnet, and a cooling system positioned within said housing, said cathode being separated from said anode and forming a target, said cooling system being connected to said target, a magnetic conductor magnetically coupled to said exciting magnet and separated therefrom, and at least one auxiliary magnet is situated on said magnetic conductor, wherein said at least one auxiliary magnet has a lower magnetic intensity than said exciting magnet and its upper level lies under the upper level of said exciting magnet.
Dependencies are inferred from the claim text.