Photographic radiation-sensitive materials having improved antistatic property
AssigneeFuji Photo Film Co., Ltd.
InventorShinzo Kishimoto
Life of this patent
Estimating the term…
Abstract
Photographic radiation-sensitive materials having an improved antistatic property which comprise a nonionic polyoxyethylene surface active agent and at least one of a thiocyanate, iodide, perchlorate and periodate in at least one layer.
Claims10
A photographic sensitive material having an improved antistatic property which comprises a nonionic polyoxyethylene surface active agent and at least one of an alkali metal thiocyanate, alkali metal and alkaline earth metal iodide, alkali metal and alkaline earth metal perchlorate and alkali metal periodate in at least one layer.
A process for preventing the generation of static charges in a photographic sensitive material which comprises incorporating into at least one layer of said photographic sensitive material, a nonionic polyoxyethylene surface active agent and at least one of an alkali metal thiocyanate, alkali metal and alkaline earth metal iodide, perchlorate, and alkali metal periodate.
Dependencies are inferred from the claim text.