High speed, low temperature and pressure diazo processing apparatus

Apparatus for developing diazo film comprising:

• first and second, spaced apart substantially parallel platens defining between them a developing chamber, the height of the developing chamber as measured by the spacing between the platens exceeding a thickness of the film by no more than an amount required to readily move the film through the chamber;
• a
• first roller pair adjacent an intake opening for the chamber and a second roller pair adjacent an outlet opening for the chamber, the roller pairs being disposed in close proximity to the platens;
• spring biased means establishing a seal between the platens and the rollers of the respective roller pair;
• gasket means between the platens sealing the developing chamber from the exterior and extending in the travel direction of the film through the chamber;
• and
• means including a groove extending transverse of the direction of travel of the film for applying relatively low pressure aqueous ammonia vapor into the developing chamber;
• whereby the film is rapidly developed in a low pressure ammonia vapor atmosphere while the escape of substantially any ammonia vapor from the chamber is prevented.

Apparatus for developing diazo film of a given width and thickness and having a substrate carrying an emulsion on a side thereof, the apparatus comprising:

• a housing defining an upstream intake opening and a downstream outlet opening dimensioned to permit passage of the film therethrough;
• first and second platens disposed within the housing having opposing, parallel first and second surfaces, a width slightly greater than the width of the film to permit passage of the film through a space between the surfaces, and being positioned to receive incoming film from the intake opening and to discharge outgoing film to the outlet opening;
• means maintaining a spacing between the surfaces which is only slightly greater than the thickness of the film and which is selected so as to permit the uninhibited passage of the film between the surfaces while minimizing the spacing between the surfaces;
• means for sealing the space from the intake and the outlet openings;
• means for advancing film in a downstream direction from the intake opening, through the space and to the outlet opening with the film emulsion facing the first surface;
• means for heating the first platen to a temperature in the range of between about 150.degree. F. to about 200.degree. F;
• at least one passageway formed in the first platen, in communication with the first surface and located proximate an upstream end thereof;
• means for supplying the passageway with aqueous ammonia;
• and
• shallow groove means for permitting evaporation of the ammonia therein to effect a discharge of the ammonia from the passageway at only slightly above atmospheric pressure;
• whereby diazo film advanced through the space is contacted by ammonia vapor discharged from the passageway and causes the formation of a turbulent ammonia vapor layer between at least portions of the emulsion and the first surface to effect the rapid developing of the emulsion at relatively low temperatures and pressures.