Electrode sputtering process for exhaust gas oxygen sensor

In a method of sputtering platinum onto a vitrified zirconia body to form an exhaust gas electrode for an electrochemical-type exhaust gas oxygen sensor, the improvement wherein the sputtering is performed using an argon atmosphere that contains at least 65% by volume of one member selected from the group consisting of nitrogen and oxygen, whereby low sensor rich-to-lean switching response times of less than 600 milliseconds are obtained that are generally equal to lean-to-rich switching response times, without post-electroding treatments.

In a method of sputtering platinum onto a solid electrolyte body to form an exhaust gas electrode for a zirconia, solid-electrolyte exhaust gas oxygen sensor, the improvement wherein the platinum is sputtered under an atmosphere consisting predominantly of nitrogen, the remainder being an inert gas and a target spacing, deposition rate and chamber pressure sufficient to provide a highly porous platinum deposit and a partially blackened zirconia surface under the platinum deposit, whereby sensor switching response time is reduced to below 250 milliseconds as deposited.

In a method of sputtering a porous platinum exhaust gas electrode onto a vitrified zirconia thimble for an electrochemical-type exhaust gas oxygen sensor wherein a generally planar platinum target is oriented normal to the axis of a zirconia thimble, the target is spaced at least about 3.0 cm from a closed end on the thimble, and the target is sputtered under an argon atmosphere at a pressure of about 10-20 millitorr and a power of about 13-22 watts/cm.sup.2 of target area, the improvement wherein the atmosphere contains more than about 65% by volume of at least one member selected from the group consisting of nitrogen and oxygen and the total pressure is about 10-20 millitorr, effective to increase sensor controllability and to reproducibly obtain sensor rich-to-lean and lean-to-rich switching response times below 250 milliseconds.

In a method of sputtering a porous platinum exhaust gas electrode onto a vitrified zirconia thimble for an electrochemical-type exhaust gas oxygen sensor wherein a generally planar platinum target is oriented normal to the axis of a zirconia thimble, the target is spaced about 3.0-5.0 cm from a closed end on the thimble, a thickness of at least about 0.65 micrometer is applied to the thimble end and the target is sputtered under argon at a pressure of about 10-20 millitorr and a DC power of about 13-22 watts/cm.sup.2 of target area, the improvement wherein the platinum is sputtered in an atmosphere consisting essentially of about 65-75% by volume nitrogen and the balance argon at a total pressure of about 10-20 millitorr, effective to increase sensor controllability and to reproducibly obtain low and symmetrical sensor rich-to-lean and lean-to-rich switching response times below 250 milliseconds without post-electroding electrolytic or heat treatments.