Instrument for determining the radiation parameters of a focused charged-particle beam and method
AssigneeLeybold-Heraeus GmbH
InventorsWalter Dietrich, Herbert Stephan
Life of this patent
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Abstract
Method and device for determining the radiation parameters of a focused beam of charged particles guided periodically over a target surface, especially in an electron beam melting and vaporizing system wherein the target is the surface of a melt. At least one probe is positioned in front of the target surface in the direction of radiation and within the beam trace, the probe being connected to an electrical display device. The output signal of the probe is displayed via a cathode ray tube and the reversal point of the charged-particle beam is determined on the basis of the time interval between the signal peaks in conjunction with the velocity of the beam movement.
Claims15
Device for determining the beam parameters of a focused beam of charged particles guided periodically over a target surface in electron beam melting wherein the target is the surface of a melt in an evaporation crucible, which comprises at least one probe means positioned in front of the target surface in the direction of the beam within the beam trace and in the marginal area of the crucible, said probe means being connected to an electrical display instrument for displaying the detected parameters relating to the beam with respect to the marginal area of the crucible.
Measuring process for determining the beam parameters of a focused beam of charged particles guided periodically over a target surface in electron beam vaporizing wherein the target is the surface of a melt in an evaporation crucible which comprises positioning a probe connected to an electrical display instrument in front of the target surface in the direction of radiation within the beam trace and in the marginal area of the crucible, displaying the output signal of the probe by means of a cathode ray tube, and determining the reversal point of the charged-particle beam with respect to the marginal area of the crucible on the basis of the time interval between the signal peaks in conjunction with the velocity of the beam movement.
In an electron beam melting apparatus having an evaporation crucible with a melt therein and a focused beam of charged particles guided periodically over the surface of the melt, the improvement comprising:
- means for controlling the beam with respect to its evaporation properties and its positioning to protect the marginal area of the crucible to prevent contamination of the vaporized melt.
In an electron beam melting process of the type wherein a focused beam of charged particles is guided periodically over the surface of a melt in an evaporation crucible, the improvement comprising protecting the marginal area of the crucible by controlling the beam with respect to its evaporation properties and its positioning to prevent contamination of the vaporized melt.
Dependencies are inferred from the claim text.