Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors
AssigneeFuji Photo Film Co., Ltd.
InventorsMasayuki Iwasaki, Shigeru Sato, Yasuo Inoue, Akira Nagashima
Life of this patent
Estimating the term…
Abstract
Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazole compounds represented by the following general formula (I): ##STR1## wherein W represents a substituted or unsubstituted aryl group, X represents a hydrogen atom, an alkyl group or an aryl group, Y represents a fluorine atom, a chlorine atom or a bromine atom, and n represents an integer of 1 to 3.
Claims13
In a photosensitive composition containing (1) a phosensitive compound selected from the group consisting of a photosensitive diazo compound, a photosensitive azide compound, an ethylenically unsaturated compound, and a compound which catalytically reacts with acids formed upon exposure to light and (2) a free radical generating agent, the improvement which comprises, said free radical generating agent being a 2-halomethyl-5-vinyl-1,3,4-oxadiazole compound represented by the following general formula (I):
- ##STR25## wherein W represents a substituted or unsubstituted aryl group, X represents a hydrogen atom, an alkyl group or an aryl group, Y represents a fluorine atom, a chlorine atom or a bromine atom, and n represents an integer of 1 to 3.
Dependencies are inferred from the claim text.