Method of producing magnetic thin film
AssigneesNippon Telegraph & Telephone Public Corporation, Fujitsu Limited
InventorsAkira Terada, Seizi Hattori, Yoshikazu Ishii, Akira Nohara, Nobuo Inagaki, Wakatake Matsuda, Susumu Kawakami
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Abstract
A method of roducing .gamma.-Fe.sub.2 O.sub.3 magnetic disk medium of continuous thin film is provided, in which a deposition source is deposited on an opposed Al-alloy substrate by means of a reactive vacuum deposition technique and the deposited film is thermally treated so as to be the magnetic disk medium. As the deposition source, a ferroalloy containing about 1 to 10 at.% Ti and about 0.5 to 5 at.% Co is employed.
Claims9
In a method of producing a .gamma.-Fe.sub.2 O.sub.3 continuous thin film magnetic disk medium wherein a deposition source is deposited on an opposed aluminum alloy substrate by means of a reactive vacuum deposition and the film thus formed thermally treated to form the .gamma.-Fe.sub.2 O.sub.3 magnetic disk medium, the improvement comprising employing as the deposition source a ferroalloy comprising from about 1 to about 10 at.% titanium, from about 0.5 to about 5 at.% cobalt, and from about 85 to about 98.5 at.% iron.
A method according to claim 10 wherein said depositing step comprises a step of performing a reactive sputtering employing said source as a negative electrode and said substrate as a positive electrode.
A method according to claim 10 wherein said depositing step comprises a step of performing a reactive evaporation in which said source is heated.
In a magnetic disk medium comprising a continuous Fe.sub.2 O.sub.3 thin film on an aluminum alloy substrate the improvement, wherein said film comprises from about 1 to about 10 at.% titanium, from about 0.5 to about 5 at.% Co and from about 85 to about 98.5 at.% iron.
Dependencies are inferred from the claim text.