Thin film photovoltaic cell and a method of manufacturing the same
AssigneeFuji Photo Film Co., Ltd.
InventorsMasatoshi Tabei, Kazuhiro Kawaziri, Yosuke Nakajima
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Abstract
An improved type of thin film photovoltaic cell can be produced by forming a thin layer of n-type CdTe up to 2 micron thick on a conductive support, heat-treating the CdTe layer at 80.degree. to 210.degree. C. for 20 to 180 minutes, and providing on the free surface of the heat-treated CdTe layer a transparent electrode.
Claims17
A method of manufacturing a photovoltaic cell which comprises providing a thin coating of n-type CdTe of up to about 2 microns thick on a conductive surface of a substrate, heat-treating said CdTe thin coating at a temperature of from about 80.degree. to 210.degree. C. for a period of from 20 to 180 minutes to form a modified surface region of said CdTe coating, and providing a transparent output electrode on the surface of said heat-treated thin coating opposite the substrate.
A thin film photovoltaic cell comprising a conductive support, an overlying n-type CdTe layer having a thickness of up to about 2 microns which has been heat-treated at about 80.degree. to 210.degree. C. for about 20 to 180 minutes and a transparent electrode on the surface of said heat treated CdTe layer opposite said support.
Dependencies are inferred from the claim text.