Photographic light sensitive material with antistatic property

Abstract

A photographic light sensitive material which contains, in at least one layer, a copolymer having a repeating unit represented by the following general formula (I): ##STR1## wherein R.sub.f represents a perfluoroalkyl group having 2 to 12 carbon atoms which may contain one hydrogen atom at the .omega.-position or a perfluoroalkenyl group; R represents a hydrogen atom or a methyl group; p represents an integer of 1 to 5; m represents an integer of 5 to 50; n represents zero or an integer of 1 to 20; and Y represents a hydrogen atom, an alkyl group having 1 to 24 carbon atoms, an alkenyl group, a phenyl group, an alkylphenyl group or one of the groups represented by R.sub.f ; whereby antistatic property (even under low humidity) and adhesion resisting property are improved without adversely affecting photographic characteristics.

Dependencies are inferred from the claim text.