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US 4,228,232 AGranted
Photopolymerizable composition containing ethylenically unsaturated oligomers
AssigneeMinnesota Mining and Manufacturing Company
InventorAlan D. Rousseau
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Abstract
A photopolymerizable composition is disclosed which comprises 10 to 60% by weight of an ethylenically unsaturated, carboxylic acid containing oligomer, 10 to 60% by weight of an organic film forming polymer, 10 to 60% by weight of a free radical polymerizable monomer having at least one ethylenically unsaturated group, and 0.1 to 12% by weight of a free radical photoinitiator system.
Claims68
A photopolymerizable composition comprising
- (1) 10% to 60% by weight of an oligomer of the formula ##STR14## wherein E is an ethylenically unsaturated, free radical polymerizable group,
- D is the residue of a polyisocyanate having at least two of its isocyanate groups reacted to form ##STR15## groups bonded to E and R, R is the residue of a polyol having at least a +b hydroxyl groups, the residue formed by removal of hydrogen from the hydroxyl groups, said polyol having a number average molecular weight between 90 and 10,000,
- A is a carboxylic acid containing group,
- a is a number having an average value between 2 and 20, and
- b is a number having an average value between 0.3 and 10,
- (2) 10% to 60% by weight of an organic film forming polymer having a molecular weight of at least 6,000,
- (3) 10% to 60% by weight of a free radical polymerizable monomer having at least one ethylenically unsaturated group, and
- (4) 0.1% to 12% by weight of a photoinitiator system capable of initiating free radical polymerization upon absorption of electromagnetic radiation.
5 more elements
Dependencies are inferred from the claim text.