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US 4,227,978 AGranted
Photohardenable composition
AssigneeMinnesota Mining and Manufacturing Company
InventorRobert W. Barton
Life of this patent
Estimating the term…
Abstract
Photohardenable compositions are described comprising a halogenated oligomeric ester, acrylate or methacrylate monomer compatible with the ester, free-radical generating initiator, epoxide, and cationic initiator. The compositions are particularly useful as plating and etching resists.
Claims17
A photohardenable composition comprising:
- (a) about 10 to 80 weight percent of a halogenated oligomeric ester having a molecular weight of less than about 10,000 and a content of halogen attached to carbon of an sp.sup.2 electronic configuration of about 19 to 55 weight percent;
- (b) about 10 to 80 weight percent of an acrylate or methacrylate monomer compatible with (a);
- (c) about 0.2 to 10 weight percent of a free radical generating initiator activatible by actinic light or electron beam irradiation;
- (d) about 2 to 20 weight percent of a compound having an average epoxide functionality of about 1 to 1.8;
- (e) about 1 to 10 weight percent of a cationic initiator activatible by actinic light or electron beam irradiation.
2 more elements
Dependencies are inferred from the claim text.