Shallow-homojunction solar cells
AssigneeMassachusetts Institute of Technology
InventorsCarl O. Bozler, Ralph L. Chapman, John C. C. Fan, Robert W. McClelland
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Abstract
Improvements in shallow-homojunction solar cells based upon a plurality of layers of a direct gap semiconductor material such as GaAs, as well as their fabrication, are disclosed. The shallow-homojunction solar cells have a n.sup.+ /p/p.sup.+ structure in which the n.sup.+ top layer is limited to a thickness which permits significant carrier generation to occur in a lower semiconductor layer. An anodic antireflection coating is applied over the n.sup.+ top layer, and a particularly preferred method for applying the antireflection coating is by anodization. These solar cells can be grown on relatively inexpensive substrates, if desired, such as silicon or germanium.
Claims6
A shallow-homojunction photovoltaic device formed from a direct bandgap semiconductor material doped to provide an n.sup.+ /p/p.sup.+ layered structure, said n.sup.+ layer having a thickness below about 1500 Angstroms thereby allowing significant carrier generation to occur in the p layer upon irradiation of said device with light on the n.sup.+ side.
Dependencies are inferred from the claim text.