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US 4,227,090 AGranted
Electron beam microfabrication apparatus and method
AssigneeHughes Aircraft Company
InventorKurt Amboss
Life of this patent
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Abstract
Electron beam microfabrication apparatus has spherically concave photocathode pattern 40 which when excited produces patterned electron beam 48 which is accelerated by electrode 44 and magnetically focused by magnet 58 to impinge as a demagnified patterned field 60 on a photoresist carrying semiconductor wafer 36 mounted of wafer holder 34.
Claims11
An electron beam microfabrication apparatus comprising:
- a substantially spherically curved female surface for receiving thereon a patterned photocathode;
- a semiconductor wafer holder positioned in front of said surface;
- and
- a lens for focusing electrons emitted from said patterned photocathode onto a wafer on said wafer holder on a demagnification scale so that when said photocathode is excited the patterned electron emission therefrom is focussed and demagnified and projected onto a resist on a wafer on said wafer holder for exposure thereon of a demagnified pattern.
1 more element
The method of exposing material supported on a wafer holder comprising the steps of:
- forming a substantially spherically female curved photocathode mask pattern;
- exciting the photocathode to produced an electron beam patterned in accordance with the photocathode mask pattern;
- accelerating, focusing, and demagnifying the electron beam with its mask pattern;
- and
- positioning material in front of the electron beam to be pattern exposed on a reduced scale.
2 more elements
Dependencies are inferred from the claim text.