Transfer and temperature monitoring apparatus
AssigneeVarian Associates, Inc.
InventorPaul E. Luscher
Life of this patent
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AssigneeVarian Associates, Inc.
InventorPaul E. Luscher
Estimating the term…
The temperature of a substrate being coated by molecular beam epitaxial techniques is monitored during the deposition process. The substrate is mounted on a holder that is brought by a carriage to a treating station where the deposition occurs. At the station, a pair of metal contact pins selectively contact a surface of the holder. One of the contact pins and the surface, when contacting, form a first thermocouple junction; a second thermocouple junction is formed by the second contact pin and surface. The thermocouple junctions have dissimilar properties so that a voltage indicative of the temperature of the object is derived between them while the pins and surface contact each other. The holder is transferred between the treating station and carriage by translational and rotational motion of the holder and the carriage. While the translational and rotational motions occur, contact between the surface of the holder and the pins is prevented.
Apparatus for monitoring the temperature of an object located at a treating station and for enabling the object to be transferred from a carriage to the treating station, and vice versa, said apparatus comprising:
In combination,
Dependencies are inferred from the claim text.