Method of repairing a defective photomask
AssigneeWestern Electric Company, Inc.
InventorsPaul D. Segal, Ching-Ping Wong
Life of this patent
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Abstract
A method of repairing pin holes in a defective photomask such as one comprising a patterned chromium film on a glass substrate comprises depositing an adhesion promoting film such as siloxane on the surface of the photomask, then depositing a solvent soluble layer such as a photoresist layer over the adhesion promoting layer, a window is then formed through the layers and underlying photomask in the area of the pin hole by burning through these layers by means of a laser. The exposed areas of the window are etched and a metallic film is deposited over the exposed surfaces. Finally, the photomask is treated with solvent for removing the solvent soluble photoresist which also causes the metal film deposited thereon to be removed in all areas except the area of the window.
Claims30
A method of repairing a defect in a film on a substrate comprises:
- coating the surface of the defective film with a solvent soluble layer;
- locating the defect to be repaired;
- forming a window through said solvent soluble layer and said underlying defective film in the area around said defect;
- coating said defective film and window with a non-solvent soluble opaque film;
- and
- stripping said solvent soluble layer from said substrate with solvent so as to remove said solvent soluble layer and said non-solvent soluble film thereover from said substrate leaving said non-solvent soluble film on said substrate in the area of said window.
A method of repairing voids in a patterned metal film on a substrate comprises:
- coating the surface of said substrate and metal film with a solvent soluble layer;
- locating the void to be repaired;
- forming a window through said solvent soluble layer and underlying patterned film in the area around said void;
- coating said solvent soluble layer and said window area with a metallic film;
- and
- stripping said solvent soluble layer from said substrate with solvent so as to remove said solvent soluble layer and said metallic film thereover from said substrate leaving said metallic film only over the area of said window.
A method of repairing pin hole defects in a photomask comprising a patterned metal film on a transparent substrate comprises:
- coating the surface of the defective photomask with a solvent soluble layer;
- locating the defect to be repaired;
- forming a window through said solvent soluble layer and underlying patterned metal film in the area around said pin hole;
- coating the exposed surfaces with a repairing metal film;
- and
- treating said photomask with solvent for stripping said solvent soluble layer and overlying repairing film leaving said repairing film in the area of said window.
Dependencies are inferred from the claim text.