Back to results
US 4,190,488 AGranted
Etching method using noble gas halides
AssigneeInternational Business Machines Corporation
InventorHarold F. Winters
Life of this patent
Estimating the term…
Abstract
A method for etching using a noble gas halide.
Claims16
A method for etching a surface comprising exposing the surface to be etched to at least one noble gas halide for a sufficient time to etch said surface to the desired extent.
Dependencies are inferred from the claim text.