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US 4,188,426 AGranted
Cold plasma modification of organic and inorganic surfaces
AssigneeLord Corporation
InventorRobert A. Auerbach
Life of this patent
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Abstract
The surfaces of organic and inorganic substrates, such as polyethylene film and metals, respectively, can be modified by cold plasma deposition of difluorocarbene or trifluoromethyl radical specie generated by subjecting precursor vapor, for example, perfluorocyclobutane or hexafluoroethane, to a radio frequency electrical glow discharge.
Claims3
A method for reducing the coefficient of friction and increasing the hydrophobicity of the surfaces of organic substrates comprising
- (a) introducing into a reaction zone a vaporized material consisting essentially of fragmentable fluorine-containing monomers;
- (b) subjecting said fluorine-containing monomer to an electrical glow discharge, whereby there is formed a reactive species wherein said fluorine-containing monomer is perfluorocyclobutane and said reactive species is difluorocarbene;
- (c) contacting in said reaction zone an organic substrate disposed in said zone with said reactive species;
- and
- (d) depositing a thin, solid continuous fluorocarbon film on said substrate.
2 more elements
A method for reducing the coefficient of friction and increasing the hydrophobicity of the surfaces of inorganic substrates comprising
- (a) disposing within a reaction zone at least one inorganic substrate;
- (b) introducing into such reaction zone a vaporized material consisting essentially of fragmentable fluorine-containing monomer;
- (c) subjecting said monomer to an electrical glow discharge, whereby there is formed a plasma comprising difluorocarbene reactive species;
- (d) contacting said substrate in said reaction zone with said reactive species;
- and
- (e) depositing a thin, solid continuous fluorocarbon film on said substrate.
3 more elements
Dependencies are inferred from the claim text.