Silver-electroplating process
AssigneeHitachi, Ltd.
InventorsYoshihiro Suzuki, Mitsuru Ura, Hiroshi Takahashi
Life of this patent
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Abstract
A process for silver-plating, which comprises steps of preplating a substrate material in an aqueous preplating solution comprising 10.sup.-5 to 0.02 mole/l of silver and more than 0.01 mole/l of a silver complexing agent such as thiocyanic ions under non-current density, to preplate a sufficient thickness of silver to restrain or substantially prevent substitution plating, and then electroplating the preplated substrate material until a sufficient thickness by supplying an electric current to said material in an aqueous silver plating solution comprising silver ions, thiocyanic ions and a film improving agent.
Claims18
A process for silver-plating which comprises the steps of preplating a substrate material in an aqueous preplating solution comprising 10.sup.-5 to 0.02 mole/l of silver and more than 0.01 mole/l of a silver complexing agent under non-current density, to preplate a sufficient thickness of silver to restrain or substantially prevent substitution plating, and then electroplating the preplated substrate material by supplying an electric current to said material in an aqueous silver plating solution comprising silver and thiocyanic ions and having a pH in a range of from 0.5 to 10.5.
Dependencies are inferred from the claim text.