Method for the epitaxial deposition of a semiconductor material by electrical polarization of a liquid phase at constant temperature

A method for the epitaxial deposition from a liquid phase, of a layer of semiconductor compound material on a substrate, comprising the steps of providing said substrate and said liquid phase in a space and applying electrical polarization between said solid and liquid in said space which is maintained at a constant and uniform temperature, said polarization being applied so that outside the growth time of said epitaxial deposit, the polarization is in the direction which causes a cooling by the Peltier effect and with a current density which is lower than the threshold level which causes the growth of said epitaxial deposit.