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US 4,104,070 AGranted
Method of making a negative photoresist image
AssigneeInternational Business Machines Corporation
InventorsHolger Moritz, Gabor Paal
Life of this patent
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Abstract
The invention relates to a method of making a negative photoresist image on a substrate, where a normally positive working photoresist material containing 1-hydroxyethyl-2-alkyl-imidazoline is applied to a substrate, image-wise exposed with actinic radiation, heated, and blanket exposed to actinic radiation. The material which was not exposed originally is then removed with a solvent to give a negative image.
Claims5
A method of making a negative photoresist image on a substrate consisting essentially of the steps of:
- Applying to a substrate a layer of a positive working photoresist material consisting essentially of a phenolformaldehyde resin, a naphthoquinone (1,2) diazide sulfonic acid ester sensitizer, and a 1-hydroxyethyl-2-alkylimidazoline,
- imagewise exposing the layer with actinic radiation,
- heating the imagewise exposed layer for a sufficient period of time to a sufficient temperature to render the exposed areas insoluble in alkaline developer,
- subsequently blanket exposing the layer with actinic radiation and, removing the portions of the layer which were not exposed during the imagewise exposure with an alkaline developer.
1 more element
Dependencies are inferred from the claim text.