Method of manufacturing amorphous alloy
AssigneeSony Corporation
InventorSatoru Uedaira
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Abstract
A method of manufacturing an amorphous alloy in which there is provided an acidic plating bath consisting predominantly of divalent iron ions and a source of hypophosphite ions, and electroplating from such a bath to produce a plated layer of an amorphous alloy consisting predominantly of iron and phosphorous.
Claims13
A method of manufacturing an amorphous plated layer alloy consisting essentially of from 60 to 88 atomic percent iron and from 12 to 30 atomic percent phosphorous and up to 10 atomic percent nickel and/or cobalt comprising providing an acidic aqueous plating bath containing:
- 1/3 to 5/3 mole/l divalent iron ions
- 0.07 to 0.42 mole/l hypophosphite ions
- and effecting the electroplating through the use of said bath under the following conditions:
- ______________________________________ pH 1.0 to 2.2 Current density 3 to 20A/dm.sup.2 Temperature 30 to 50.degree. C ______________________________________
A method of manufacturing an amorphous plated layer alloy consisting predominantly of iron and phosphorous comprising providing an acidic aqueous plating bath containing:
- 1/3 to 5/3 mole/l divalent iron ions
- 0.07 to 0.42 mole/l hypophosphite ions
- 4 .times. 10.sup.-5 to 8 .times. 10.sup.-3 mole/l cupric ions
- and effecting the electroplating through the use of said plating bath under the following conditions:
- ______________________________________ pH 1.0 to 2.2 Current density 3 to 20A/dm.sup.2 Temperature 30 to 50.degree. C ______________________________________
Dependencies are inferred from the claim text.