Dioxolane derivatives and use as photoinitiators

Compounds having the general formula:

• ##STR4## wherein R.sup.1 is an organic radical selected from the group consisting of vinyl, hydroperoxy, alkyl or alkenyl groups of up to about 16 carbon atom length, cycloaliphatic groups of lower than 210 molecular weight, phenyl, naphthyl, phenoxy, benzoyl, naphthoxyl, phenylcarboxy, and substituted aliphatic groups of up to 200 molecular weight, and Ar.sup.1 and Ar.sup.2 are each selected from the group consisting of naphthyl, non-sterically hindered substituted phenyl, and non-sterically hindered substituted naphthyl in which each substituent is a radical selected from the group consisting of amino, nitro, chloro-, bromo-, iodo, fluoro-, lower alkylamino-, anilino-, di- lower alkylamino-, diphenylamino, lower alkoxy, carboxy, hydroxy, sulfonyl, acetyl, propionyl, aldehydro, acetoxy, propionoxy, amido, lower alkylamido, vinyl, lower alkenyl, lower alkynyl, lower alkyl, phenyl, benzyl, naphythyl, cyclohexyl, cyclopentyl, lower alkyl amido, di- lower alkyl amido, phenyl amido, and diphenyl amido with the proviso that Ar.sup.1 or Ar.sup.2 is not lower alkyl-substituted phenyl.

Compounds having the general formula:

• ##STR5## wherein Ar.sup.1 is selected from the group consisting of naphthyl, non-sterically hindered substituted phenyl, and non-sterically hindered substituted naphthyl in which each substituent is a radical selected from the group consisting of amino, nitro, chloro-, bromo-, iodo-, fluoro-, lower alkylamino-, anilino-, di- lower alkylamino-, diphenylamino, lower alkoxy, carboxy, hydroxy, sulfonyl, acetyl, propionyl, aldehydro, acetoxy, propionoxy, amido, lower alkylamido, vinyl, lower alkenyl, lower alkynyl, lower alkyl, phenyl, benzyl, naphthyl, cyclohexyl, cyclopentyl, lower alkyl amido, di- lower alkyl amido, phenyl amido, and diphenyl amido with the proviso that Ar.sup.1 is not lower alkyl-substituted phenyl.

Compounds having the general formula:

• ##STR6## wherein Ar.sup.2 is selected from the group consisting of naphthyl, non-sterically hindered substituted phenyl, and non-sterically hindered substituted naphthyl in which each substituent is a radical selected from the group consisting of amino, nitro, chloro-, bromo-, iodo-, fluoro-, lower alkylamino-, anilino-, di- lower alkylamino-, diphenylamino, lower alkoxy, carboxy, hydroxy, sulfonyl, acetyl, propionyl, aldehydro, acetoxy, propionoxy, amido, lower alkylamido, vinyl, lower alkenyl, lower alkynyl, lower alkyl, phenyl, benzyl, naphthyl, cyclohexyl, cyclopentyl, lower alkyl amido, di- lower alkyl amido, phenyl amido, and diphenyl amido with the proviso that Ar.sup.2 is not lower alkyl-substituted phenyl.