Process control circuit for metal-depositing baths
AssigneeSiemens Aktiengesellschaft
InventorsHubert De Steur, Wolfgang Pernegger, Egon Bussmann
Life of this patent
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Abstract
A process control circuit which is adapted for the control and monitoring of a plurality of parameters in one or more metal-depositing baths, has parameter control circuit blocks for each of the parameters to be measured. Each of the parameter control circuit blocks has a measuring stage for producing a measured value corresponding to one of the parameters, a calibration stage for calibrating the measuring stage, a comparison stage for comparing the measured value to a stored nominal value, and a dosing circuit which is connected to the comparator and which doses the metal-depositing bath in response to a comparison signal from the comparator.
Claims11
A process control circuit adapted for the simultaneous and repeated control and monitoring of a plurality of parameters in at least one metal-depositing bath, comprising:
- a. an independent parameter control circuit block for each of said plurality of parameters, each block having
- i. measuring means for producing a measured value for one of said parameters;
- ii. calibrator means connected to the measuring means for calibrating said measuring means;
- iii. comparator means connected to said measuring means for comparing said measured value to a nominal value stored in said comparator means and creating a comparison signal;
- iv. a dosing means connected to said comparator means for dosing said metal-depositing bath in response to said comparison signal;
- b. a program generator means connected to each of the parameter control circuit blocks for controlling the operation of each in a simultaneous fashion so as to simultaneously control and monitor the bath parameters, said program generator means including at least
- i. first switch means in each parameter circuit block for activating the calibrator means, and
- ii. second switch means in each parameter circuit block for activating the measuring, comparator and dosing means to maintain tight control over the value of each parameter in the bath.
Dependencies are inferred from the claim text.