Integrated circuit device including both N-channel and P-channel insulated gate field effect transistors

An integrated circuit device comprising:

• a. a body of semiconductor material predominantly of one conductivity type, said body having a surface;
• b. a field shield comprising a first frame-like structure including a layer of insulating material on said surface and a layer of conductive material on said layer of insulating material, said field shield having a closed geometry which encloses a first portion of said surface and separates said first portion of said surface from a second portion of said surface;
• c. a well region having a conductivity type opposite that of said body, said well region extending into said body only from said first portion of said surface;
• d. a well contact for making ohmic contact to said well region, said well contact being totally within the region surrounded by said first frame-like structure including a part of said first portion of said surface;
• e. at least one semiconductor device extending into said well region from said first portion of said surface, said semiconductor device comprising:
• i. a second frame-like structure including a layer of insulating material on said first portion of said surface and a layer of conductive material on said layer of insulating material, said second frame-like structure having a closed geometry separating an outer portion of said first portion of said surface from an inner portion of said first portion of said surface;
• ii. a first region of the same conductivity type as said body extending into said well region from said inner portion of said first portion of said surface, said first region being surrounded by said second frame-like structure;
• iii. a second region of the same conductivity type as said body extending into said well region from said outer portion of said first portion of said surface, said second region surrounding said second frame-like structure;
• f. a substrate contact for making ohmic contact to said body comprising a guard band immediately surrounding said first frame-like structure, said guard band being of the same conductivity as said body and having a higher conductivity than said body;
• g. at least one semiconductor device extending into said body from that part of said second portion of said surface lying outside of said guard band, said semiconductor device comprising:
• i. a third frame-like structure including a layer of insulating material on said second portion of said surface and a layer of conductive material on said layer of insulating material, said third frame-like structure having a closed geometry separating an outer portion of said second portion of said surface from an inner portion of said second portion of said surface,
• ii. a third region of opposite conductivity type to said body extending into said body from said inner portion of said second portion of said surface, said third region being surrounded by said third frame-like structure;
• iii. a fourth region of opposite conductivity type to said body extending into said body from said outer portion of said second portion of said surface, said fourth region surrounding said third frame-like structure.