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US 4,063,269 AGranted
Semiconductor photoelectron emission device
AssigneeHamamatsu Terebi Kabushiki Kaisha
InventorsKatsuo Hara, Minoru Hagino, Tokuzo Sukegawa
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Abstract
Semiconductor photoelectron emission device comprising mixed crystals of two or more different semiconductors forming a heterojunction with direct transition type defining a first region in which may be excited by photoelectrons and an indirect transition type defining a second region whose forbidden band gap is wider than that of the first region and the surface of which is a photoelectron emission surface.
Claims5
A semiconductor photoelectron emission device comprising:
- ohmic contacts;
- a first layer of p-type Al.sub.x Ga.sub.(1-x) Sb, wherein x is a positive number less than 1, having high impurity concentration and predetermined forbidden band and being of an indirect transition type semiconductor;
- a second layer of Al.sub.x Ga.sub.(1-x) Sb having a low impurity concentration and wider forbidden band;
- a third layer of n-type GaSb, said third layer having at selected portions, different layers of direct transition type semiconductor of p-type impurity thereby to form thereat with said first layer a heterojunction;
- said third layer and said first layer having substantially the same crystal structures at said junction and having small differences in lattic constants;
- a fourth layer at parts of said third layer substantially absent said diffused p-type impurity, said fourth layer comprising high concentration p-type Al.sub.x Ga.sub.(1-x) Sb;
- a fifth layer of p-type GaSb on said fourth layer;
- and electrodes on said fifth layer, whereby said ohmic contacts are disposed on said first layer at selected areas wherein transversely are absent said diffused p-type impurities, and said first layer has an electron emissive surface at areas not covered by said ohmic contacts and thereby to form a transmission type device.
5 more elements
Dependencies are inferred from the claim text.