Pesticidal compounds, processes and compositions
AssigneeImperial Chemical Industries PLC
InventorsRaymond Alexander Burrell, John Michael Cox
Life of this patent
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Abstract
Pesticidal tetrazole derivatives having the formula: ##STR1## wherein n is 0, 1, 2, 3 or 4; R.sup.1 is OH, halogen, alkyl, alkoxy, alkylthio, alkylsulphonyl, NO.sub.2, NH.sub.2 (optionally substituted), acyl, aroyl, CN, carboxy or sulphonic-acid or -ester or -amide; R.sup.2 is hydrogen or optionally-substituted alkyl; R.sup.3 and R.sup.4 are hydrogen or optionally-substituted alkyl, aryl, cycloalkyl or acetyl but R.sup.4 is not aryl or cycloalkyl if R.sup.3 is one of these two groups; and salts thereof when R.sup.2 is hydrogen.
Claims7
A tetrazole derivative having the structural formula:
- ##STR18## where R.sup.1 is hydrogen or chlorine, R.sup.2 and R.sup.3 are hydrogen or alkyl containing 1 to 4 carbon atoms;
- R.sup.4 is hydrogen, alkyl containing from 1 to 4 carbon atoms, cyclohexyl or acetyl;
- and salts thereof.
A pesticidal composition comprising as an active ingredient a pesticidally effective amount of a tetrazole derivative having the formula:
- ##STR19## where R.sup.1 is hydrogen or chlorine, R.sup.2 and R.sup.3 are hydrogen or alkyl containing 1 to 4 carbon atoms;
- R.sup.4 is hydrogen, alkyl containing from 1 to 4 carbon atoms, cyclohexyl or acetyl;
- or a salt thereof together with a carrier for said active ingredient.
A process for combating fungi which comprises contacting said fungi or a locus thereof with an effective amount of a tetrazole derivative which has the formula:
- ##STR20## where R.sup.1 is hydrogen or chlorine, R.sup.2 and R.sup.3 are hydrogen or alkyl containing 1 to 4 carbon atoms;
- R.sup.4 is hydrogen, alkyl containing from 1 to 4 carbon atoms, cyclohexyl or acetyl;
- or a salt thereof.
Dependencies are inferred from the claim text.