Method of manufacturing a thin-film electrode
AssigneeContraves AG
InventorHarry Zust
Life of this patent
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Abstract
A method of manufacturing a thin-film electrode constituting a multi-layer electrode structure supported at an electrically insulating surface of a supporting element, comprising: a first step of depositing a thin-film layer on said surface and, in succession a second step of depositing an additional thin-film layer on top of the previously deposited thin-film layer, said second depositing step being carried out at least once, and the last one of the depositing steps being carried out in a vacuum chamber under reduced pressure of a residual gas.
Claims3
A method of manufacturing a thin-film electrode consituting a multi-layer electrode structure supported at an electrically insulating surface of a supporting element, comprising the steps of:
- a. depositing a thin-film layer on said surface and, in succession,
- b. depositing an additional thin-film layer on top of the previously deposited thin-film layer,
- c. said second depositing step being carried out at least once,
- d. the last one of the depositing steps comprising vapor depositing an electrochemically active black layer of gold, said vapor deposition being carried out in a vacuum chamber under reduced pressure of a residual gas in a pressure range of 0.1 to 2 Torr.
Dependencies are inferred from the claim text.