Process for preparing novel thin films
AssigneeSumitomo Chemical Company, Limited
InventorsTakezo Sano, Masao Sasaki
Life of this patent
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Abstract
A thin film of less than 300 microns in thickness can be obtained by crosslinking a surfactant with plasma or radiation. This thin film is as high in strength as an ordinary plastic film, and is usable as a substance-separating film, a substance-protecting film or an insulating film.
Claims14
A process for preparing a novel thin film which comprises crosslinking the surface of a layer of a surfactant selected from the group consisting of fatty acid salts, sulfuric acid esters of higher alcohols, alkylbenzenesulfonates, alkylnaphthalenesulfonates, naphthalenesulfonic acid-formalin condensates, dialkyl sulfosuccinates, alkyl phosphates, polyoxyethylene sulfates, alkylamine salts, quaternary ammonium salts, polyoxyethylene alkylamines, polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, sorbitan fatty acid esters, polyoxyethylene fatty acid esters, hydroxyethylene sorbitan fatty acid esters, hydroxyethylenehydroxypropylene block polymers, fatty acid monoglycerides, and alkyl betaines, by irradiation with plasma, and then washing away the uncrosslinked portion of said surfactant with water or the like solvent to obtain an extremely thin film.
Dependencies are inferred from the claim text.