Method for enhancing solid solution stability of electron acceptor molecules and electrophotographic compositions
AssigneeXerox Corporation
InventorsSam R. Turner, John M. Pochan
Life of this patent
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Abstract
Disclosed is a method for enhancing the resistance to crystallization of solid solutions containing electron acceptor molecules. According to this method, electron acceptor molecules are chemically modified whereby the resulting compound is capable of undergoing polymerization. This modified material is thereafter dissolved in a suitable polymeric resin and subsequently exposed to a source of activating energy thereupon causing such modified material to polymerize within the polymeric resin. The resulting composition exhibits enhanced resistance to crystallization and thus is suitable for use in electrophotographic devices and methods.
Claims11
A method for enhancing the resistance of solid solutions containing electron acceptor molecules to phase separation, said method comprising:
- a. providing a solid solution containing a polymeric resin and at least 25 weight percent of at least one compound of the formula ##STR3## wherein R is ##STR4## R' is hydrogen or methyl;
- X and Y are independently selected from the group consisting of --NO.sub.2, halogen, cyano and --CF.sub.3 ;
- Z is oxygen or dicyanomethylene;
- and
- a and b can range from 0 to 3;
- with the proviso that at least one of R is ##STR5## b. exposing said solid solution to sufficient thermal energy, electromagnetic radiation and/or electron beam bombardment to effect polymerization of the electron acceptor compounds within the solid solution.
An electrophotographic imaging member comprising a photoconductive insulating layer which comprises a solid solution of a polymeric resin and at least 25 weight percent of at least one compound of the formula ##STR6## wherein R is ##STR7## R' is hydrogen or methyl;
- X and Y are independently selected from the group consisting of --NO.sub.2, halogen, cyano and --CF.sub.3 ;
- Z is oxygen or dicyanomethylene;
- and
- a and b can range from 0 to 3;
- with the proviso that at least one of R is ##STR8## said electron acceptor compound having been exposed to a sufficient thermal energy, electromagnetic radiation and/or electron beam bombardment to effect polymerization of said compound within the solid solution.
In an electrophotographic imaging process comprising the steps of providing an electrophotographic imaging member having a photoconductive insulating layer and forming a latent image on the surface of said photoconductive insulating layer, the improvement comprising;
- an electrophotographic imaging member comprising a photoconductive insulating layer which comprises a solid solution of a polymeric resin and at least 25 weight percent of at least one compound of the formula ##STR9## wherein R is ##STR10## R' is hydrogen or methyl;
- X and Y are independently selected from the group consisting of --NO.sub.2, halogen, cyano and --CF.sub.3 ;
- Z is oxygen or dicyanomethylene;
- and
- a and b can range from 0 to 3;
- with the proviso that at least one of R is ##STR11## said electron acceptor compound having been exposed to a sufficient thermal energy, electromagnetic radiation and/or electron beam bombardment to effect polymerization of said compounds within the solid solution.
A method for enhancing the resistance of solid solutions containing electron acceptor molecule to phase separation, said method comprising:
- a. providing an electron acceptor compound which has been previously chemically modified by the attachment thereto of an acrylate or methacrylate substituent;
- b. dissolving at least 25 weight percent of said chemically modified electron acceptor in a phase compatible polymeric resin thereby forming a solid solution;
- and
- c. subjecting said solid solution to sufficient thermal energy, electromagnetic radiation and/or electron beam bombardment to effect polymerization of the chemically modified electron acceptor compound.
Dependencies are inferred from the claim text.