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AssigneeGTE Laboratories Incorporated
InventorJohn Schlafer
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In an optical scanning apparatus for photolithographic processing of faceplates intended for color cathode ray tubes, a light beam from a source is first deflected through an angle related to a predetermined angle of incidence that an electron beam in an operating tube has with respect to a defined faceplate location, and then the deflection point is imaged onto or in the vicinity of the faceplate. This angle of incidence adjustment is accomplished for each faceplate location as the light beam is scanned over the surface of the faceplate. The light source, which is preferably a laser light source, creates a light beam having a wavelength spectrum which exposes the photosensitive material. The beam is deflected by a pair of orthogonally aligned mirrors which are rotated by galvanometers. Each galvanometer is driven by a current from an electrical control, the current being related to the proper angle of incidence for each faceplate location. An optical focusing device images the point of deflection of the light beam substantially onto the faceplate. This image of the deflection source is then scanned over the surface of the faceplate in a predetermined pattern by a mirror which is rotated about a pair of orthogonal axes by motors which are controlled by the electrical control. By this arrangement, the photoresist on the faceplate is correctly exposed at the proper location to be in registration with the electrons landing on the faceplate after passing through the same mask apertures in the completed cathode ray tube.
An optical scanning apparatus for use in manufacturing cathode ray tubes wherein a layer of a photosensitive material on the inner surface of a tube faceplate is exposed by scanning a light beam over an array of light-transmitting apertures in a mask disposed adjacent to the layer of material on the faceplate, the apparatus including:
An optical scanning apparatus for use in manufacturing cathode ray tubes wherein the photosensitive material on a faceplate is exposed by light directed through an array of light-transmitting regions in a mask including:
A method of manufacturing cathode ray tubes wherein a layer of a photosensitive material on the inner surface of a tube faceplate is exposed by scanning a light beam over an array of light-transmitting apertures in a mask disposed adjacent to the layer of material on the faceplate, the method including the steps of:
Dependencies are inferred from the claim text.
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No related US applications are recorded in the indexed filing history.
By photographic processes: devices for carrying out the processes, e.g. light houses
Electric discharge tubes or discharge lamps
Term ended 11 Oct 1994 (estimated)
USPTO file history isn’t available for this patent, so only indexed dates are shown.
A concurrently filed application entitled "Optical Scanning Apparatus And Method For Manufacturing Cathode Ray Tubes" bears Ser. No. 699,110 and is filed in the name of John Schlafer, G. Norman Williams and R. F. Wilson. Also, a concurrently filed application entitled "Control System For An Optical Scanning Exposure System For Manufacturing Cathode Ray Tubes" bears Ser. No. 699,045 and is filed in the name of Thomas W. Schultz. Further, a concurrently filed application entitled "Overlap And Overscan Exposure Control System" bears Ser. No. 699,054 and is filed in the name of Mahlon B. Fisher and G. Norman Williams. In addition, a concurrently filed patent application entitled "Exposure Area Control For An Optical Scanning System For Manufacturing Cathode Ray Tubes" bears Ser. No. 699,046 and is filed in the name of Thomas W. Schultz. Lastly, a concurrently filed application entitled "Scanning Rate And Intensity Control For Optical Scanning Apparatus" bears Ser. No. 699,047 and is filed in the name of Thomas W. Schultz.
The present invention relates to a method of and apparatus for photolithographic processing of faceplates intended for color cathode ray tubes having an aperture mask, and more specifically, to exposing photosensitive material with a scanning light beam.
The exposure of this photosensitive material provides a means for delineating the pattern of other material applied to the faceplate for generating, filtering or blocking light or for other functions. In a typical method, phosphor is dusted onto the surface of the photosensitive material, after which the material is selectively exposed. Then, the unexposed photosensitive material is removed from the faceplate by well-known techniques. An important step in this method is the act of exposing the photosensitive material at the proper locations on the faceplate.
In the drawings:
FIG. 1 is a block diagram of an optical scanning exposure system including an optical scanning apparatus according to the invention and an electrical control for the apparatus;
FIG. 2 is a diagram illustrating the various optical components of an embodiment of the optical scanning apparatus;