Methods of defining regions of crystalline material of the group III-V compounds
AssigneeRCA Corporation
InventorsGregory Hammond Olsen, Vladimir Sinisa Ban
Life of this patent
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Abstract
A thin coating of carbon is used as a mask to define regions of a crystalline material of the group III-V compounds. A carbon mask is coated on portions of a surface of a substrate and the masked substrate contacted with the group III-V material to deposit the crystalline material only on the portions of the surface of the substrate not covered with the masking coating. The group III-V material will not be deposited on the carbon coating, since it is incapable of nucleating the growth of the crystalline material. Accordingly, a defined region of the crystalline material is formed. The carbon masking coating can also be used as a mask for etching cavities or recesses in a substrate of the group III-V material.
Claims8
A method of forming a defined region of a group III-V crystalline material on a substrate capable of nucleating the growth of said material comprising the steps of:
- providing a thin masking coating of carbon on a surface of the substrate except where the defined region of crystalline material is to be provided, said carbon coating being incapable of nucleating the growth of said crystalline material, and
- contacting the masked substrate with the crystalline material to deposit a first layer of crystalline material thereon, whereby said material is not deposited on the carbon coating but only on the surface of the substrate which is not covered by said coating.
Dependencies are inferred from the claim text.