Ion implanted zener diode

A integrated circuit containing a zener diode with an accurately predetermined breakdown voltage and a transistor protected by and sharing an electrode in common with the zener diode, said integrated circuit comprising:

• a body of semiconductive material having a plurality of transistors formed therein adjacent a surface of said body;
• one of said transistors in a portion of said body that is of one conductivity type and lightly doped to a resistivity greater than about 10 ohm-centimeter, said transistor connected to circuit apparatus subject to voltage surges in excess of a predetermined operating voltage;
• a first island-like region of said one conductivity type implanted in the surface of said one conductivity type portion;
• an accurately predetermined first concentration of implanted impurity atoms of said one conductivity type in said first region and having a trucated gaussian distribution normal to said surface that is maximum about 500-2000 angstroms below said surface and said maximum is within the range of about 1 .times. 10.sup.16 to 1 .times. 10.sup.19 atoms per cubic centimeter of semiconductive material;
• a second island-like region of opposite conductivity type diffused within said body and forming a first PN junction with said body portion that has a breakdown voltage higher than said predetermined operating voltage, and a second PN junction with said first region that has a breakdown voltage equal to said predetermined breakdown voltage;
• a predetermined second concentration of conductivity determining impurity atoms of said opposite type in said second region that is maximum adjacent said surface and said maximum is at least two orders of magnitude greater than said first concentration;
• a first electrode means on said body in low resistance electrical communication with said body portion and said first region;
• and
• a second electrode means on said body in low resistance electrical communication with said second region.

An integrated circuit containing a zener diode with an accurately predetermined breakdown voltage and a metal-insulator-semiconductor field effect transistor protected by and having a region in common with the zener diode, said integrated circuit comprising;

• a body of semiconductive material having a plurality of metal-insulator-semiconductor field effect transistors formed therein adjacent a surface of said body;
• at least one of said transistor having a PN junction;
• a first region of one conductivity type semiconductive material extending from said transistor PN junction and intersecting said surface, said region electrically connected to circuit apparatus subject to voltage surges in excess of a predetermined operating voltage;
• a predetermined first concentration of conductivity determining impurity of said one type in said first region that is maximum adjacent said surface and said maximum is in excess of 1 .times. 10.sup.19 atoms per cubic centimeter of semiconductive;
• material
• a second region of opposite conductivity type semiconductive material extending from said transistor PN junction and intersecting said surface, said portion having a resistivity of at least about 10 ohm-centimeter;
• a third region of opposite conductivity type implanted in said second region surface, a portion of said implanted third region being contiguous said first region and forming a second PN junction therewith coextensive with a portion of said transistor PN junction whereby said second PN junction can perform a zener diode function with respect to said transistor PN junction;
• an accurately predetermined second concentration of implanted impurity atoms of said opposite conductivity type in said third region at least adjacent said second PN junction to provide an accurately predetermined breakdown voltage for said second PN junction that is equal to the said predetermined operating voltage, said implanted impurity concentration being at least two orders of magnitude less than said first predetermined concentration and within the range of about 1 .times. 10.sup.16 to 1 .times. 10.sup.19 atoms per cubic centimeter of semiconductive material;
• first electrode means on said body for applying a transistor operating voltage to both of said PN junctions through said first region;
• and
• second electrode means on said body in low resistance electrical communication with said third region by which transistor operating voltages in excess of said predetermined transistor operating voltage are limited with respect to said transistor PN junction by breakdown of said zener PN junction and said transistor is protected from unwanted overvoltage effects.

An integrated circuit containing a zener diode with an accurately predetermined breakdown voltage and a bipolar transistor protected by and having an electrode in common with the zener diode, said integrated circuit comprising:

• a body of semiconductive material having a plurality of transistors formed therein adjacent a surface of said body;
• at least one of said transistors having a collectors PN junction electrically connected to circuit apparatus subject to voltage surges in excess of a predetermined operating voltage;
• one conductivity type portion of said body extending from said collector PN junction and intersecting said surface, said portion having a resistivity of at least about 10 ohm-centimeter;
• a first island-like region of opposite conductivity type semiconductive material inset within said portion surface spaced from said junction;
• a predetermined first concentration of conductivity determining impurity of said opposite type in said first region that is maximum adjacent said surface and said maximum is in excess of 1 .times. 10.sup.19 atoms per cubic centimeter of semiconductive material;
• a second island-like region of said one conductivity type implanted in said body surface spaced from said collector PN junction, a portion of said implanted second region being contiguous said first region and forming a second PN junction therewith;
• an accurately predetermined second concentration of implanted impurity atoms of said one conductivity type in said second region adjacent said second PN junction to provide an accurately predetermined breakdown voltage for said second PN junction that is equal to the desired predetermined operating voltage of said collector PN junction whereby said second PN junction can perform a zener diode function with respect to said collector PN junction, said implanted impurity concentration being at least two orders of magnitude less than said first concentration and within the range of about 1 .times.10.sup.16 to 1 .times.10.sup.19 atoms per cubic centimeter of semiconductive material;
• first electrode means on said body in low resistance electrical communication with said portion and said second region for applying a transistor operating voltage to both of said PN junctions;
• a second electrode means on said body in low resistance electrical communication with said first region providing a discrete second electrode for said zener diode PN junction by which transistor operating voltages in excess of said predetermined transistor operating voltage are limited with respect to said collector PN junction by breakdown of said zener diode PN junction and said transistor is protected from unwanted overvoltage effects.