Process for the passivation of ferrosilicon
AssigneeSociete Pyreneenne du Silico-Manganese
InventorMaurice Sales
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Abstract
A process for the passivation of discrete particles of ferrosilicon containing 30-90% by weight silicon comprises contacting the particles with a gaseous oxidizing agent at a temperature between 800.degree.-1150.degree. C for a time ranging between 1-12 hours. The treated particles can be admixed with a binding agent to form a paste which, in turn, is used as a coating for shielded arc electrodes.
Claims5
A process for the passivation of discrete particles of ferrosilicon containing 30 to 90% by weight silicon comprising contacting said ferrosilicon particles with a gaseous oxidizing agent containing a gaseous inorganic acid, said gaseous oxidizing agent being selected from the group consisting of air, oxygen, steam or carbon dioxide, at a temperature between about 800.degree. and 1150.degree. C for a period of time ranging between about one and twelve hours.
Dependencies are inferred from the claim text.