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US 4,050,941 AGranted
High resolution photohardenable coating compositions containing tetracyanoethane compounds
AssigneeE. I. Du Pont de Nemours and Company
InventorJose Francisco Pazos
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Abstract
Photohardenable coating compositions containing A. a substantially solid, organic composition comprising a nongaseous, ethylenically unsaturated compound, B. a tetracyanoethane compound, and C. an organic, radiation-sensitive free radical generating system provide high resolution films and coatings such as photoresist coatings on substrates.
Claims17
A photohardenable coating composition which comprises
- a. a substantially solid, organic composition comprising an addition polymerizable, nongaseous, ethylenically unsaturated compound capable of forming a high polymer by free-radical initiated chainpropagating addition polymerization, and a macromolecular, organic, polymeric binder.
- b. 1.0-10% by weight, based on the total solvent-free coating, of an organic, radiation-sensitive free-radical generating system activatable by actinic radiation which initiates polymerization of the unsaturated compound, and
- c. 0.04-3% by weight, based on the total solvent-free coating, of a tetracyanoethane compound of the formula
- R.sup.1 C(CN).sub.2 C(CN).sub.2 R.sup.2
- where R.sup.1 and R.sup.2 are both p-chlorophenyl or p-biphenyl, or
- R.sup.1 is p-biphenyl and R.sup.2 is ##STR7## where m and n represent the number of repeat units, or R.sup.1 and R.sup.2 are joined together to form the --CH(OC.sub.2 H.sub.5)CH.sub.2 -- radical, or
- R.sup.1 and R.sup.2 are joined together to form the ##STR8##
4 more elements
Dependencies are inferred from the claim text.