Photoreactive compositions comprising polymers containing alkoxyaromatic glyoxy groups
AssigneeThe Richardson Company
InventorsThaddeus M. Muzyczko, Thomas H. Jones
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Abstract
A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
Claims63
A light sensitive composition comprising a polymer which includes as a recurring structure:
- ##STR4## wherein Ar is a bivalent aromatic radical and M is selected from the class consisting of hydrogen, alkali metal, ammonium and substituted ammonium.
The composition of claim 12 in which said effective amount is an amount sufficient to provide a concentration of said polymer in the range of 0.5 to 10 percent by weight based on the combined weight of the polymer and solvent.
A light sensitive composition comprising a polymer which includes as a recurring structure:
- ##STR7## wherein R is selected from a group consisting of hydrogen, aryl, alkyl, halo, and aralkyl having up to 10 carbon atoms and n is from 0 to 18, Ar is a bivalent aromatic radical and M is selected from a class of hydrogen, alkali metal, ammonium and substituted ammonium.
A lithographic plate including a support member and a film formed from a photoreactive composition, said composition comprising a polymer which includes as a recurring structure:
- ##STR8## wherein Ar is a bivalent aromatic radical and M is selected from the class consisting of hydrogen, alkali metal, ammonium and substituted ammonium.
A light sensitive composition comprising effective amounts of a photosensitizer and a polymer which includes as a recurring structure:
- ##STR9## wherein Ar is a bivalent, an aromatic radical and M is selected from the class consisting of hydrogen, alkali metal, ammonium and substituted ammonium.
A light sensitive composition comprising effective amounts of a photosensitizer, an unsaturated material selected from the group consisting of unsaturated monomers, unsaturated oligomers and unsaturated polymers, together with a polymer which includes as a recurring structure:
- ##STR11## wherein Ar is a bivalent aromatic radical and M is selected from the class consisting of hydrogen, alkali metal, ammonium and substituted ammonium.
A photoreactive ink composition comprising a colorant and polymer which includes as a recurring structure:
- ##STR13## wherein Ar is a bivalent aromatic radical and M is selected from the class consisting of hydrogen, alkali metal, ammonium and substituted ammonium.
A device for use in photochemical and photomechanical processes comprising a backing member and a film applied thereto, said film including a polymer having as a recurring structure:
- ##STR15## wherein Ar is a bivalent aromatic radical and M is selected from the class consisting of hydrogen, alkali metal, ammonium and substituted ammonium.
Dependencies are inferred from the claim text.