Starting product for the production of a read-only memory and a method of producing it and the read-only memory
AssigneeTeletype Corporation
InventorsRobert K. Jones, Harry Sue
Life of this patent
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AssigneeTeletype Corporation
InventorsRobert K. Jones, Harry Sue
Estimating the term…
A read-only memory is manufactured from a matrix or array of multilayer electrical devices, each of which includes at least one metallic layer, a portion of which contacts a doped semi conductor region. The metallic layers are controllably and rapidly thinned down and decreased in cross-sectional area in the vicinity of the doped regions to form fusible links, thus producing a ROM starting product. Fusible link formation is enhanced by the use of an etchant for the metallic layer which forms an electrochemical cell in conjunction therewith and with the semiconductor and the doped region. Any metallic layers not contacting a doped region are also etched by the etchant, but at the much slower "chemical rate". Following the production of the starting product, a ROM may be produced by the selective application of voltages to selected fusible links, the I.sup.2 R heating of the links fusing them, or blowing them out. In a preferred embodiment, the electrical devices are MOSFETS.
A method of forming a ROM from a matrix of semiconductive devices which each include a plurality of electrodes, at least one of which electrodes in each device includes a metallic conductor in contact with a doped semiconductor region, wherein the method comprises:
A method of forming a ROM from a plurality of coplanar MOS devices, the insulated gates of each of which are connected to a selected one of a plurality of column conductors, each device including a pair of controlled electrodes each in contact with a doped region of a semiconductor, one of the controlled electrodes of each device being connected to a selected one of a plurality of row conductors, the other controlled electrode being grounded, wherein the method comprises:
An improved method of decreasing the cross-sectional area of selected conductors associated with doped semiconductor regions of an array of semiconductive devices, preparatory to blowing out predetermined ones of the selected cross-sectionally decreased conductors by I.sup.2 R heating, wherein the improvement comprises:
Dependencies are inferred from the claim text.