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US 3,961,961 AGranted
Positive or negative developable photosensitive composition
AssigneeMinnesota Mining and Manufacturing Company
InventorLarry D. Rich
Life of this patent
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Abstract
A positive and negative developable photosensitive composition including a photopolymerizable monomer, photoinitiator, and a blend of polymers, one an acid soluble amino containing polymer, the other a compatible, acid insoluble, film-forming, polymer. The composition, which can be developed positively with dilute aqueous acid or negatively with dilute base, is useful in silk screen printing and as a photoresist composition in general.
Claims10
An article comprising a substrate having thereover a light-sensitive layer comprising:
- 1. at least one free-radical polymerizable monomer having at least one terminal vinyl group and a boiling point above 100.degree.C., said monomer being free of acidic and basic moieties,
- 2. at least one photoinitiator in an amount sufficient to polymerize said polymerizable monomer upon exposure to actinic radiation, and
- 3. a blend comprising:
- a. at least one acid soluble amino containing polymer of the formula ##EQU4## wherein R.sup.4 is hydrogen or methyl;
- A is selected from the class consisting of hydrogen, alkyl having up to 18 carbon atoms, vinyl, isopropenyl, phenyl, alkoxy having up to 18 carbon atoms, alkoxycarbonyl having up to 18 carbon atoms, carboalkoxy having up to 18 carbon atoms, tetrahydrofurloxycarbonyl, carbamoyl, N,N-di(lower alkyl) carbamoyl, pyrrolidinyl, and cyano groups;
- R.sup.5 and R.sup.6 are each selected from the class consisting of hydrogen, lower alkyl, and phenyl groups and R.sup.5 and R.sup.6 together with the N may be a piperidino or morpholino group;
- R.sup.7 is selected from divalent alkylene having 2 to 18 carbon atoms and phenylene groups;
- R.sup.8 is hydrogen or lower alkyl group;
- X is oxygen or N-R.sup.9 wherein R.sup.9 is hydrogen or a lower alkyl group;
- m is zero or a positive integer;
- and n is a positive integer;
- and
- b. at least one compatible, acid insoluble, film-forming polymer,
- said free radical polymerizable monomer and said components of said blend being present in an amount sufficient to allow said composition upon imagewise actinic radiation exposure to be developed positively and negatively as desired.
11 more elements
Dependencies are inferred from the claim text.