Linear oxadiazole-imide copolymers
AssigneeWestinghouse Electric Corp.
InventorLawrence W. Frost
Life of this patent
Estimating the term…
Abstract
Polymers containing both oxadiazole and imide recurring units are made from soluble polymeric precursors that contain hydrazide and/or amic acid recurring units. Dehydration of the hydrazide produces the oxadiazole unit and dehydration of the amic acid produces the imide unit. The oxadiazole unit may also be advantageously formed in various monomeric hydrazine compounds. The monomeric hydrazine compounds are made reactive by converting the dinitroso form of the compound into a reactive diamino form. The polymers may be used as molding and laminating resins, wire coatings, films, filaments and adhesives.
Claims6
A film and filament forming polymer consisting essentially of the repeating unit ##SPC11##
A film and filament forming polymer consisting essentially of the repeating unit ##SPC12##
- wherein R is selected from the group consisting of ##SPC13##
A substantially insoluble and infusible oxadiazole-imide copolymer consisting essentially of the repeating unit ##SPC14##
A substantially insoluble and infusible oxadiazole-imide copolymer consisting essentially of the repeating units ##EQU3## wherein R is ##SPC15##
- R' and R" are divalent aromatic radicals selected from the group consisting of ##SPC16##
A soluble resinous polymeric intermediate consisting essentially of the repeating unit ##EQU4## wherein R is selected from the group consisting of ##SPC17##
- and R' and R" are divalent aromatic radicals selected from the group consisting of ##SPC18##
A thin cast resinous film characterized by its outstanding flexibility and thermal stability consisting essentially of the repeating unit ##EQU5## wherein R is selected from the group consisting of ##SPC19##
- and R' and R" are divalent aromatic radicals selected from the group consisting of ##SPC20##
Dependencies are inferred from the claim text.