Block copolyesters of polysiloxanes
AssigneeEastman Kodak Company
InventorJohn Duval Cawley
Life of this patent
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Abstract
Solvent soluble block copolyesters consisting essentially of units having the formula: ##EQU1## WHEREIN R is an alkylene radical containing at least 3 carbon atoms; R.sup.1 is an alkyl radical and R.sup.2 is an alkyl, alkaryl, aralkyl or aryl radical; A is an alkylene or arylene radical; a is an integer of at least 10; b is an integer of at least 1; c is an integer of at least 2; and d is an integer of at least 2; are formed by first reacting a dihalo-polydiorganosiloxane with a dihydric phenol or other diol and subsequently reacting the resulting reaction product with a dicarboxylic acid halide. These polymers are useful as release agents and leveling agents and find particular utility as abhesive materials for waterless lithographic printing plates.
Claims26
A solvent-soluble block copolyester having a molecular weight of at least 10,000 and an inherent viscosity greater than 0.2 in chloroform, and having the formula:
- ##EQU5## wherein R is an alkylene radical containing at least 3 carbon atoms, A is selected from the group consisting of alkylene radicals containing from about 2 to about 25 carbon atoms, and arylene radicals containing from about 6 to about 25 carbon atoms derived from aromatic diols, R.sup.1 is an alkyl radical containing from about 1 to about 10 carbon atoms, and R.sup.2 is selected from the group consisting of R.sup.1, phenyl, naphthyl, and anthracenyl and aralkyl wherein the alkyl portion contains from 1 to 10 carbon atoms and alkaryl wherein the alkyl portion contains from 1 to 10 carbon atoms, b is an integer of at least 1, a is an integer of at least 10, c is an integer of at least 2, and d is an integer of at least 2.
A solvent-soluble block copolyester having a molecular weight of at least 10,000, and an inherent viscosity greater than 0.2 in chloroform, and having the formula:
- ##EQU6## wherein R is an alkylene radical containing 3 to 20 carbon atoms, A is selected from the group consisting of alkylene having 2 to 20 carbon atoms and bisphenylene radicals, R.sup.1 and R.sup.2 are alkyl radicals containing 2 to 10 carbon atoms, a is an integer of 10 to 200, b is an integer of 1 to 25, c is an integer of 5 to 20, and d is an integer of 2 to 1000.
A solvent-soluble block copolyester having the formula:
- ##SPC5##
- wherein a is from about 10 to about 200, b is from about 1 to about 25, c is from about 5 to about 20 and d is from about 2 to about 1000.
A method of preparing a solventsoluble block copolyester having a molecular weight of at least 10,000 and an inherent viscosity of at least 0.2 in chloroform comprising reacting (1) an alpha, omega-dihalo-polydiorganosiloxane comprising from about 10 to about 200 chemically combined diorganosiloxy units consisting essentially of organosiloxy units wherein each of the silicon atoms has two hydrocarbon radicals attached through a carbon-silicon bond wherein at least one of said hydrocarbon groups is an alkyl group and (2) an aliphatic or aromatic diol and subsequently reacting the reaction product of (1) and (2) with an aliphatic dicarboxylic acid halide containing at least 5 carbon atoms.
The method of forming a solvent-soluble block copolyester comprising reacting, in a chlorohydrocarbon solvent, an alpha,.OMEGA.-dichloropolydimethylsiloxane with 2,2-bis(4-hydroxyphenyl)propane, and subsequently reacting the reaction product with sebacyl chloride in a chlorohydrocarbon solvent.
The method of forming a solvent-soluble block copolyester comprising reacting in a chlorohydrocarbon solvent an alpha,.OMEGA.-dichloropolydimethylsiloxane with butylene glycol and subsequently reacting the reaction product with sebacyl chloride in a chlorohydrocarbon solvent.
Dependencies are inferred from the claim text.