Layer-by-layer formation of through-substrate via
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTsung-Chieh Hsiao, Ke-Gang Wen, Liang-Wei Wang, Dian-Hau Chen
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTsung-Chieh Hsiao, Ke-Gang Wen, Liang-Wei Wang, Dian-Hau Chen
Estimating the term…
An integrated circuit (IC) device includes a substrate. The IC device includes a multi-layer interconnect structure disposed over a first side of the substrate. The multi-layer interconnect structure includes a plurality of metal layers. The IC device includes a first portion of a through-substrate via (TSV) disposed over the first side of the substrate. The first portion of the TSV includes a plurality of conductive components belonging to the plurality of metal layers of the multi-layer interconnect structure. The IC device includes a second portion of the TSV that extends vertically through the substrate from the first side to a second side opposite the first side. The second portion of the TSV is electrically coupled to the first portion of the TSV.
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Dependencies are inferred from the claim text.