System and method for detecting semiconductor processing error

A method, comprising:

• during a photomask development process performed to develop a photomask on a wafer in a chamber of a semiconductor processing device comprising a liquid distribution component configured to dispense a developer liquid flowing with an intact curtain profile, capturing first images of a view of the chamber;
• determining first curtain profile classifications of the first images, wherein each curtain profile classification of the first curtain profile classifications indicates:
• a first value indicating that an image exhibits the developer liquid flowing with the intact curtain profile;
• or
• a second value indicating that the image does not exhibit the developer liquid flowing with the intact curtain profile;
• determining a plurality of groups of images based upon an order of the first images and the first curtain profile classifications of the first images;
• and
• determining, based upon the plurality of groups, whether the photomask development process is associated with a potential processing error.

A method, comprising:

• during a semiconductor fabrication process performed using a semiconductor processing device comprising a liquid distribution component configured to dispense a liquid flowing with an intact curtain profile, capturing first images of a view of a chamber of the semiconductor processing device;
• determining, using a trained machine learning model, first curtain profile classifications of the first images, wherein a curtain profile classification of the first curtain profile classifications indicates:
• a first value indicating that an image exhibits the liquid flowing with the intact curtain profile;
• or
• a second value indicating that the image does not exhibit the liquid flowing with the intact curtain profile;
• determining, based upon an order of the first images and the first curtain profile classifications of the first images, a plurality of groups of images associated with the first value, wherein each group of the plurality of groups comprises contiguous images associated with curtain profile classifications that indicate the first value;
• and
• determining, based upon the plurality of groups, whether the semiconductor fabrication process is associated with a potential processing error.