Display device, electronic device and method for fabricating display device

An electronic device comprising:

• a display device having a resolution of 4,000 pixels per inch (PPI) or more;
• an optical member external to the display device and configured to adjust a path of light emitted from the display device;
• and
• a housing configured to accommodate the display device and the optical member,
• wherein the display device includes,
• a substrate;
• an insulating layer on the substrate;
• a first electrode and a spacer on the insulating layer;
• a bank layer on the first electrode and the insulating layer and at least partially defining a first opening overlapping the first electrode;
• a light emitting stack layer on the first electrode, the bank layer, and the spacer;
• and
• a second electrode on the light emitting stack layer, wherein
• the first electrode includes a first conductive layer on the insulating layer and a second conductive layer on the first conductive layer,
• the spacer includes a first sub-spacer on the insulating layer and a second sub-spacer on the first sub-spacer,
• the second sub-spacer at least partially overlaps the first sub-spacer,
• in a plan view, an area of the second sub-spacer is more than an area of the first sub-spacer, and
• the first sub-spacer and the first conductive layer are at a same level.

A method for fabricating a display device, comprising:

• forming an insulating layer on a substrate;
• forming a first preliminary conductive layer on the insulating layer, the first preliminary conductive layer being connected to a transistor through a contact hole defined in the insulating layer;
• forming a second sub-spacer on the first preliminary conductive layer, the second sub-spacer not overlapping an emission area;
• forming a second preliminary conductive layer on the first preliminary conductive layer and the second sub-spacer;
• forming a photoresist pattern on the second preliminary conductive layer, the photoresist pattern overlapping the emission area;
• and
• patterning the first preliminary conductive layer and the second preliminary conductive layer using the photoresist pattern and the second sub-spacer as masks to form a first conductive layer and a second conductive layer between the photoresist pattern and the insulating layer and form a first sub-spacer between the second sub-spacer and the insulating layer, the second conductive layer being disposed on the first conductive layer, and the first sub-spacer overlapping the second sub-spacer,
• wherein in a plan view, an area of the second sub-spacer is more than an area of the first sub-spacer, and
• the first sub-spacer and the first conductive layer are disposed at a same level.