Display device and manufacturing method thereof

A manufacturing method of a display device comprising:

• preparing a substrate including a pixel circuit layer and a display element layer sequentially stacked;
• forming a first semiconductor layer, an active layer, and a second semiconductor layer on a base substrate;
• providing light emitting elements which are individually separated by etching the first semiconductor layer, the active layer, and the second semiconductor layer, and patterned in a matrix form defined by a first arrangement direction and a second arrangement direction perpendicular to the first arrangement direction;
• separating the base substrate from the light emitting elements, and connecting the light emitting elements on a donor film;
• and
• disposing the light emitting elements disposed on the donor film on the substrate, wherein
• the preparing of the substrate includes:
• forming the pixel circuit layer including a first pixel circuit area and a second pixel circuit area which are spaced apart from each other in a first direction and extend in a second direction perpendicular to the first direction;
• forming the display element layer including a first electrode corresponding to the first pixel circuit area and a second electrode corresponding to the second pixel circuit area on the pixel circuit layer,
• in the forming of the display element layer, the first electrode and the second electrode are rotated by an angle in a clockwise or counterclockwise direction with respect to a center point of the first electrode and a center point of the second electrode respectively, to extend in a third direction and be spaced apart from each other in a fourth direction intersecting the third direction, and
• the third direction and the second arrangement direction are not parallel or orthogonal to each other.