Semiconductor image-sensing structure
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWEI-LIN CHEN, CHUN-HAO CHOU, KUO-CHENG LEE
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWEI-LIN CHEN, CHUN-HAO CHOU, KUO-CHENG LEE
Estimating the term…
An image sensor device includes a semiconductor substrate having a front-side surface and a backside surface opposite to the front-side surface, a logic device disposed over the front-side surface of the semiconductor substrate, a photo-sensing element disposed in the semiconductor substrate, an interconnect structure disposed over the front-side surface of the semiconductor substrate, and an EO modulator disposed over the backside surface of the semiconductor substrate. The EO modulator includes a first electrode, a second electrode over the first electrode, and a micro-lens disposed between the first electrode and the second electrode. The logic device is disposed between the interconnect structure and the photo-sensing element in a direction perpendicular to the front-side surface of the semiconductor substrate.
A semiconductor image-sensing structure, comprising:
A semiconductor image-sensing structure, comprising:
A semiconductor image-sensing structure, comprising:
Dependencies are inferred from the claim text.