Image sensing device and method for manufacturing the same
AssigneeSK hynix Inc.
InventorJi Suk PARK
Life of this patent
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Abstract
An image sensing device including an air grid is disclosed. The image sensing device includes a light guide layer including one or more first air grid structures disposed in an active pixel array and a light blocking structure disposed in an optical black pixel array; and a light filter layer including a second air grid structure that overlaps the one or more first air grid structures and is disposed between a plurality of color filters, and disposed on the light guide layer, wherein a height of an air region included in the one or more first air grid structures is equal to a height of the light blocking structure.
Claims20
An image sensing device comprising:
- an active pixel array region including an active pixel array of pixels;
- an optical black pixel array region disposed adjacent to the active pixel array and including an optical black pixel array of pixels;
- a light guide layer including:
- one or more first air grid structures disposed in the active pixel array region;
- and a light blocking structure disposed in the optical black pixel array region;
- and
- a light filter layer including a second air grid structure that overlaps the one or more first air grid structures and disposed between a plurality of color filters, and disposed on the light guide layer,
- wherein each first air grid structure includes an air region that is filled with air and surrounded by a material layer,
- wherein a height of the air region is equal to a height of the light blocking structure.
An image sensing device comprising:
- a plurality of active pixels;
- a plurality of first air grid structures disposed at boundaries between the plurality of active pixels and including a first air region that is filled with air and surrounded by a material layer;
- a light blocking structure disposed at one side of the plurality of first air grid structures;
- and
- a plurality of second air grid structures disposed at the boundaries between the plurality of active pixels and including a second air region that is filled with air and surrounded by a material layer, the plurality of second air grid structures being disposed over the plurality of first air grid structures,
- wherein a top surface of the first air region is disposed on a same plane as a top surface of the light blocking structure.
A method for manufacturing an image sensing device comprising:
- forming a light blocking structure in an optical black pixel array and a first sacrificial layer having a same height as the light blocking structure in an active pixel array adjacent to the optical black pixel array;
- etching a portion of the first sacrificial layer;
- forming a first capping layer formed to surround a top surface and side surfaces of the etched first sacrificial layer;
- forming at least one first support layer on the first capping layer;
- forming an optical coating layer formed to cover the first support layer;
- forming a second sacrificial layer on the optical coating layer;
- etching a portion of the second sacrificial layer;
- forming a second capping layer formed to surround a top surface and side surfaces of the etched second sacrificial layer;
- forming a second air region by removing the second sacrificial layer;
- and
- forming a second support layer on the second capping layer.
Dependencies are inferred from the claim text.